Rotor-Stator Technology
Homogenizers
High-performance homogenizers serving as "all-in-one" units for homogenization, discharge, and CIP pumping.
Overview
"All in one" – Homogenizer, Discharge Pump and CIP Pump in one unit
Product Range
Our Homogenizer Models

VH100
8000 rpm3 HP onwards

VH200
6500 rpm5 HP onwards

VH300
4800 rpm10 HP onwards
Capabilities
Features & Options
General Features
- Rotor-stator principle
- Maximum shear rate and flow
- Tip speed up to 30 m/s
- High pumping output for homogenization and CIP operation
- Additional CIP pump not required
- Product discharge without discharge pump
- Quick homogenization of highly viscous and flowable products
- Direct influence on droplet and particle size results in highest stable emulsion
- Maximum energy density
- Double acting mechanical cartridge seal maximum reliability
Available Options
- Flanged for direct mount to vessel bottom
- Stand-alone skid mounted for mobile use
- Customization option for existing vessel
Interactive
Induction System Detail
Hover or click the glowing dots to explore each component.

High-Shear Physics & Mechanics Visualizer
Rotor-Stator Shear Force Simulation
Adjust rotor tip speed and precision stator gap clearance to see real-time calculated shear rate ($\gamma$), power density, and particle size reduction.
35 m/s
10 m/s (Standard)30 m/s50 m/s (Ultra High Shear)
0.20 mm
0.10 mm (Micro-Gap)0.30 mm0.50 mm
Hydrodynamic Shear Principle: As high-speed rotor teeth pass precision stator slots, intense hydraulic shear and localized cavitation tear particle agglomerates apart.
Hydrodynamic CalculationsReal-Time Simulation
Calculated Shear Rate ($\gamma$)
175,000 s⁻¹
Shear Rate = Tip Speed (35 m/s) / Gap Clearance (0.0002 m)
Est. Mean Droplet Size< 1.03 µmStable Emulsion Range
Energy Dissipation Density43.8 kW / LLocalized Workhead Energy
Particle Size De-agglomeration PreviewInput 50µm → Output <1.03µm
50µm
Raw AgglomerateRotor-Stator Shear Zone
<1.03µm Uniform
Need the Right Homogenizer?
Our engineers will match the perfect model and configuration to your process requirements.